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Contact person |
Judit Budai |
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The Nanofabrication and Scanning Electron Microscope laboratory operates a RAITH e-LINE Plus electron microscope and electron lithography system (EBL) and a Scios 2 HiVac electron microscope and focused ion-beam device (FIB). The two devices are accessible for electron microscopy investigations and for the fabrication of nanostructured samples.
The nanolithography capabilities of the EBL system allows the writing of high-resolution nanostructures, like metallic nanostructure arrays for plasmonic applications. For the nanolithography, the whole technological chain is available with a plasma cleaner, spin coater, fume-hood, hotplate, ultrasonic bath and metallization.
The FIB system is accessible for the direct writing of nanopatterns, milling of thin film cross-sections, and preparation of transmission electron microscope lamella.
Figure 1: The a) EBL and b) the FIB systems, example c) nanostructures fabricated with the EBL device and d) grating coupler milled into gold waveguides by using the FIB system
Specifications for the EBL system:
Schottky type thermal field emission (TFE) electron source energy selectable between 100 eV – 30 keV
Spotsize smaller than 2 nm @ 20kV.
Detectors:
Everhart-Thornley secondary electron detector
In-lens secondary and backscattered electron detectors rotation and tilt module for samples of 10 x 10 mm
X-ray spectrometer and energy dispersive microanalysis system
20 MHz pattern generator and fast electrostatic beam blanker
minimum grating periodicity ≤ 40 nm
minimum feature size ≤ 8 nm 1
100 x 100 mm travel range laser interferometer-controlled stage
Specifications for the FIB system:
Schottky type thermal field emission (TFE) electron source
energy selectable between 200 eV – 30 keV
Ga ion source
energy selectable between 500V and 30 kV
beam current from 1.5 pA to 65 nA.
Pt gas-injection system
nano-manipulator
Detectors:
Everhart-Thornley secondary electron detector
in-lens secondary and backscattered electron detectors
scanning TEM detector
Sample holder rotatable between -15° and 90° and tilted by 0 to 360°
Flat solid samples larger than 5mm x 5 mm can be handled for imaging.
Detectors for the EBL system:
Everhart-Thornley secondary electron detector
In-lens secondary and backscattered electron detectors rotation and tilt module for samples of 10 x 10 mm
X-ray spectrometer and energy dispersive microanalysis system
Detectors for the FIB system:
Everhart-Thornley secondary electron detector
In-lens secondary and backscattered electron detectors
Scanning TEM detector
[1] V. Hanus, V. Csajbók, Z. Pápa, J. Budai, Z. Márton, G. Z. Kiss, P. Sándor, P. Paul, A. Szeghalmi, Z. Wang, B. Bergues, M. F Kling, G. Molnár, J. Volk, P. Dombi, Light-field-driven current control in solids with pJ-level laser pulses at 80 MHz repetition rate, Optica, 8 (4), 570-576
https://doi.org/10.1364/OPTICA.420360
[2] Z. Pápa, P. Sándor, B. Lovász, J. Budai, J. Kasza, Z. Márton, P. Jójárt, I. Seres, Z. Bengery, C. Németh, P. Dombi, P. Rácz, Control of plasmonic field enhancement by mode-mixing, Applied Physics Letters, 120 (5) 053103
https://doi.org/10.1063/5.0072168
[3] Z. Pápa, J. Kasza, J. Budai, Z. Márton, G. Molnár, P. Dombi, Tuning plasmonic field enhancement and transients by far-field coupling between nanostructures, Applied Physics Letters 117 (8) 081105
https://doi.org/10.1063/5.0015374
[4] S Maragkaki, GD Tsibidis, L Haizer, Z Pápa, R Flender, B Kiss, Z Márton, E Stratakis, Tailoring surface topographies on solids with Mid-IR femtosecond laser pulses, Applied Surface Science, 612, 155879