The Nanofabrication and Scanning Electron Microscope laboratory operates:
1) A RAITH e-LINE Plus electron microscope and electron lithography system (EBL), accessible for electron microscopy and nanolithography, which allows the writing of high-resolution nanostructures together with standard SEM imaging. For nanofabrication the whole lift-off technological chain is available with a plasma cleaner, spin coater, fume-hood, hotplate, ultrasonic bath and metallization.
- Schottky type thermal field emission (TFE) electron source energy selectable between 100 eV – 30 keV
- Spotsize smaller than 2 nm @ 20kV.
- Detectors:
- Everhart-Thornley secondary electron detector
- In-lens secondary and backscattered electron detectors rotation and tilt module for samples of 10 x 10 mm
- X-ray spectrometer and energy dispersive microanalysis system 20 MHz pattern generator and fast electrostatic beam blanker
- minimum grating periodicity ≤ 40 nm
- minimum feature size ≤ 8 nm.
- 100 x 100 mm travel range laser interferometer-controlled stag
2) A Scios 2 HiVac electron microscope and focused ion-beam device (FIB), accessible for imaging and nanofabrication. The Ga source allows the milling of thin film cross-sections, direct writing of nanopatterns and preparation of TEM lamellae.
- Schottky type thermal field emission (TFE) electron source
energy selectable between 200 eV – 30 keV
- Ga ion source
energy selectable between 500V and 30 kV
beam current from 1.5 pA to 65 nA.
- Pt gas-injection system
- nano-manipulator
- Detectors:
- Everhart-Thornley secondary electron detector
- in-lens secondary and backscattered electron detectors
- scanning TEM detector
- The sample holder can be rotated between -15° and 90° and tilted by 0 to 360°
