Research Equipment

Research Equipment

The Nanofabrication and Scanning Electron Microscope Laboratory

The Nanofabrication and Scanning Electron Microscope laboratory operates:
 
1) A RAITH e-LINE Plus electron microscope and electron lithography system (EBL), accessible for electron microscopy and nanolithography, which allows the writing of high-resolution nanostructures together with standard SEM imaging. For nanofabrication the whole lift-off technological chain is available with a plasma cleaner, spin coater, fume-hood, hotplate, ultrasonic bath and metallization.

  • Schottky type thermal field emission (TFE) electron source energy selectable between 100 eV – 30 keV
  •      Spotsize smaller than 2 nm @ 20kV.
  •      Detectors:
    • Everhart-Thornley secondary electron detector
    • In-lens secondary and backscattered electron detectors rotation and tilt module for samples of 10 x 10 mm
  •      X-ray spectrometer and energy dispersive microanalysis system 20 MHz pattern generator and fast electrostatic beam blanker
  •      minimum grating periodicity ≤ 40 nm
  •      minimum feature size ≤ 8 nm.
  •      100 x 100 mm travel range laser interferometer-controlled stag

2) A Scios 2 HiVac electron microscope and focused ion-beam device (FIB), accessible for imaging and nanofabrication. The Ga source allows the milling of thin film cross-sections, direct writing of nanopatterns and preparation of TEM lamellae.

  •      Schottky type thermal field emission (TFE) electron source    
    energy selectable between 200 eV – 30 keV
  •      Ga ion source   
    energy selectable between 500V and 30 kV    
    beam current from 1.5 pA to 65 nA.
  •       Pt gas-injection system
  •       nano-manipulator
  •       Detectors:
    • Everhart-Thornley secondary electron detector
    • in-lens secondary and backscattered electron detectors
    • scanning TEM detector
  •       The sample holder can be rotated between -15° and 90° and tilted by 0 to 360°

 

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